Liquid crystal display device

ABSTRACT

A liquid crystal display device having an outer shape of a display region formed other than a rectangle. A driver for supplying a video signal is disposed outside the display region. A selector with selector TFT is disposed between the display region and the driver. A video signal line is disposed between the driver and the selector, and a drain line is disposed between the selector and the display region. A scanning circuit for supplying a scanning signal to the scanning line is disposed outside the display region. The selector is disposed between the scanning line and the display region, and covered with ITO as the common electrode. The common bus wiring is disposed outside the selector.

CLAIM OF PRIORITY

The present application claims priority from Japanese Patent ApplicationJP 2015-214375 filed on Oct. 30, 2015, the content of which is herebyincorporated by reference into this application.

BACKGROUND

The present invention relates to a display device, and moreparticularly, to the display device having a display region and an outershape configured into the shape other than a rectangle.

The liquid crystal display device as one of the display devices includesa TFT substrate having pixels including pixel electrodes and thin filmtransistors (TFT) arrayed in a matrix, a counter substrate which facesthe TFT substrate, and a liquid crystal interposed between the TFTsubstrate and the counter substrate. An image is formed by controllingthe luminous transmittance of liquid crystal molecules for each pixel.The use of the flat and light-weight liquid crystal display device hasbeen extended in various fields.

In most cases, the liquid crystal display device has the display regionor the outer shape formed into a rectangle. However, the display deviceused for the automobile or various types of game machines may berequired to have the display region or the outer shape formed into theshape other than a rectangle. Japanese Unexamined Patent ApplicationPublication No. 2008-292995 discloses the problem of the scanning linedriving circuit, which occurs owing to the shape of the display deviceother than a rectangle, and the countermeasure to be taken for copingwith the problem.

SUMMARY

In the case where the display region is shaped other than a rectangle,layouts of the peripheral circuits and wirings which are arranged aroundthe display device will be different from the layout of those on therectangular display region. The display device shaped other than arectangle may cause the problem that will be hardly caused by therectangular display region. The display region shaped other than arectangle will be referred to as a “variant-shape display region”, andthe display panel having the display region shaped other than arectangle will be referred to as a “variant-shape display panel”hereinafter.

The variant-shape display panel may be mostly demanded to exhibit highresolution. The high resolution may require more pixels in the lateraldirection as well as the number of drain lines for supplying videosignals to the pixels accordingly. The increase in the number of thedrain lines may increase the number of the drain routing lines in thearea outside the display region, which enlarges the area of the wiringregion for the increased drain routing lines. Recently, the width fromthe end of the display region to the end of the display panel, that is,the frame region has been increasingly demanded to be reduced. It isnecessary to reduce the number of drain routing lines for the purpose ofreducing the frame region.

The technique for reducing the number of drain routing lines has beenintroduced for the purpose of preventing increase in the number of thoselines. That is, the selector circuit to be described later is used forreducing the number of the video signal lines supplied from the driverIC to ½ or ⅓. Use of the selector circuit for the variant-shape displayregion causes interference between the selector circuit and the scanningline or between the common wiring and the selector circuit (intersectionon the layout, or electrical effect owing to intersection or proximity).

It is an object of the present invention to provide the display deviceconfigured to have the display region with reduced frame area in spiteof the variant-shape display panel with the variant-shape display regionincluding the selector circuit.

Specifically, the present invention is configured as described below.

(1) The liquid crystal display device in which an outer shape of thedisplay region is shaped other than a rectangle, which includes a TFTsubstrate on which scanning lines extending in a first direction arearranged along a second direction, drain lines extending in the seconddirection are arranged along the first direction, and pixels are formedin the regions defined by the scanning lines and the drain lines, and acounter substrate disposed to face the TFT substrate via the liquidcrystal. The driver for supplying video signals is disposed outside thedisplay region. The selector with the selector TFT is disposed betweenthe display region and the driver. Video signal lines are disposedbetween the driver and the selector, and the drain lines are disposedbetween the selector and the display region. The relationship betweenthe number of the drain lines corresponding to the display region, thatis, Nd and the number of the video signal lines corresponding to thedrain line, that is, Nv is expressed as Nd/Nv=n, where n denotes aninteger equal to or larger than 2.

The scanning circuit for supplying the scanning signal to the scanningline is disposed outside the display region, and the selector isdisposed between the scanning line and the display region, or betweenthe scanning circuit and the display region. The selector is coveredwith the ITO as the common electrode, and the common bus wiring isdisposed outside the selector.

(2) The selector control signal line for applying the gate voltage tothe selector TFT is formed on the same layer on which the drain linesare formed.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a sectional view of a display region of a liquid crystaldisplay device;

FIG. 2 is a view showing an example of a variant-shape display panel;

FIG. 3 is a view showing an equivalent circuit representing the selectorstructure;

FIG. 4 is a schematic view representing a peripheral part of the displayregion;

FIG. 5 is a plan view showing a layout of the peripheral part of thedisplay region in the state where the drain lines have been formed;

FIG. 6 is a plan view showing a layout of the peripheral part of thedisplay region in the state where the pixel electrodes have been formed;

FIG. 7 is a sectional view of a selector part;

FIG. 8 is a view showing another example of a variant-shape displaypanel; and

FIG. 9 is a plan view showing a layout of the rectangular displayregion.

DETAILED DESCRIPTION

The viewing angle is an important property for the liquid crystaldisplay device as one of various types of display devices. The viewingangle property refers to the phenomenon which varies luminance orchromaticity in accordance with the viewing angle, for example, at whichthe screen is viewed from the front or the diagonal direction. The IPS(In Plane Switching) method exhibits the excellent viewing angleproperty, which is designed to operate the liquid crystal molecules inthe horizontal electric field. In the embodiment to be described later,the explanation will be made on the assumption of using the liquidcrystal display device of IPS type. The present invention is applied tothe structure outside the display region. However, the cross sectionstructure of the display region will be preliminarily described forexplaining the layer structure.

FIG. 1 is a sectional view of the liquid crystal display device of IPStype. The TFT shown in FIG. 1 is of so called top gate type, and employsLTPS (Low Temperature Poly-Si) as the semiconductor. Referring to FIG.1, a first base film 101 as SiN, and a second base film 102 as SiO₂ areapplied to a glass substrate 100 through CVD (Chemical VaporDeposition). The first base film 101 and the second base film 102 serveto prevent impurities of the glass substrate 100 from contaminating asemiconductor layer 103.

The semiconductor film 103 formed on the second base film 102 is derivedfrom the process of forming an a-Si film on the second base film 102through the CVD, which is then converted into a poly-Si film throughlaser annealing. The poly-Si film is then patterned by photolithography.The parts of the semiconductor layer 103, which are designated by D andS denote the drain part and the source part of the TFT, respectively.

A gate insulation film 104 formed on the semiconductor film 103 is inthe form of the SiO₂ film constituted of TEOS (tetraethoxysilane) formedthrough the CVD. A gate electrode 105 as the scanning line is formed onthe gate insulation film. The gate electrode 105 is constituted of, forexample, the MoW film. Use of Al alloy may satisfy the requirement oflessening resistance of the gate electrode 105 or the scanning line 10.

An interlayer insulation film 106 constituted of SiO₂ is formed whilecovering the gate electrode 105 so as to insulate the gate electrode 105from a contact electrode 107. A through hole 120 is formed in theinterlayer insulation film 106 and the gate insulation film 104 for thepurpose of connecting the source part S of the semiconductor layer 103to the contact electrode 107. The photolithography is conductedsimultaneously for forming the through hole 120 both in the interlayerinsulation film 106 and the gate insulation film 104.

The contact electrode 107 formed on the interlayer insulation film 106is connected to a pixel electrode 112 via a through hole 130. The TFT isconnected to the drain line at a not shown part.

The contact electrode 107 and the drain line are simultaneously formedon the same layer. Use of AlSi alloy for forming the contact electrode107 and the drain line (which will be represented as the contactelectrode 107) is intended to lessen resistance. As the AlSi alloycauses hillock, or diffuses Al into the other layer, the AlSi issandwiched between barrier layers or cap layers constituted of MoW (notshown), for example.

An inorganic passivation film (insulation film) 108 serves to cover thecontact electrode 107 to protect the TFT as a whole. The inorganicpassivation film 108 is formed through the CVD likewise the first basefilm 101. An organic passivation film 109 constituted of thephotosensitive acrylic resin is formed while covering the inorganicpassivation film 108. Besides the acrylic resin, it is possible to usesilicone resin, epoxy resin, and polyimide rein for forming the organicpassivation film 109. As the organic passivation film 109 serving as theplanarizing film is formed to have a large thickness in the range from 1to 4 μm, and in most cases, approximately 2 μm.

The through hole 130 is formed in the organic passivation film 109 forconduction between the pixel electrode 112 and the contact electrode107. An ITO (Indium Tin Oxide) is derived from sputtering, which isformed as a common electrode 110, and is patterned to remove the ITOfrom the through hole 130 and its periphery. The common electrode 110may be formed into the planar shape for the respective pixels. As thecommon electrode is the firstly formed ITO, it may be called the firstITO.

Thereafter, the SiN to be formed as a capacitive insulation film 111 isapplied to the entire surface through the CVD. The through hole is thenformed in the capacitive insulation film 111 and the inorganicpassivation film 108 for conduction between the contact electrode 107and the pixel electrode 112 in the through hole 130.

The ITO is formed by sputtering, and patterned to form the pixelelectrode 112. As the pixel electrode is the secondly formed ITO, it maybe called the second ITO. The pixel electrode has a bent stripe-likesurface as shown in FIG. 6. The pixel electrode is bent so as to makethe viewing angle property further uniform. The alignment film materialis applied onto the pixel electrode 112 by the flexographic printing orink jet printing, and is baked to form an alignment film 113. Thealignment film 113 is subjected to the alignment process through therubbing method or photo alignment method using the polarized UV light.

Voltage application across the pixel electrode 112 and the commonelectrode 110 generates the electric force line as shown in FIG. 1. Aliquid crystal molecule 301 is rotated in the electric field so that theimage is formed by controlling quantity of light passing through aliquid crystal layer 300 for each pixel.

Referring to FIG. 1, a counter substrate 200 is formed while interposingthe liquid crystal layer 300 with the TFT substrate. A color filter 201is formed on the inner surface of the counter substrate 200. The colorfilter 20 includes red, green, and blue filters for each pixel forforming a color image. A black matrix 202 is formed between the colorfilters 201 for improving the image contrast. The black matrix 202serves as the light shielding film for the TFT, preventing inflow of thephotoelectric current to the TFT.

An overcoat film 203 is formed while covering the color filter 201 andthe black matrix 202. Concavo-convex surfaces of the color filter 201and the black matrix 202 may be planarized by the overcoat film 203. Thealignment film 113 is formed on the overcoat film for determining theinitial alignment of the liquid crystal. Likewise the alignment film 113at the side of the TFT substrate 100, the rubbing method or the photoalignment method is employed for the alignment process of the alignmentfilm 113.

As the above-described structure is a mere example, there may be thecase that the inorganic passivation film 108 is not formed for the TFTsubstrate 100 depending on the structure type. The process for formingthe through hole 130 may also differ depending on the structure type.The present invention will be described in detail referring to theembodiment as follows.

First Embodiment

FIG. 2 shows an example of the variant-shape display panel having both adisplay region 1000 and an outer shape formed into a racetrack shape,specifically, having upper and lower linear sides, and left and rightcurved sides. FIG. 2 is a plan view of the panel at the TFT substrateside. Referring to FIG. 2, the display region 1000 includes laterallyextending scanning lines 10, and longitudinally extending drain lines20. The pixel is formed in each region defined by the scanning lines 10and the drain lines 20.

As FIG. 2 shows, a selector 30 and a driver IC 40 are disposed below thedisplay region 1000. A terminal region 150 is formed outside the driverIC 40 for connection to a flexible wiring substrate. A video signal issupplied from the driver IC 40 to the drain lines 20 on the displayregion 1000 via the selector 30. The number of the drain lines 20corresponds to the number of pixels on the display region 1000 in thelateral direction. The number of video signal lead-out lines 21 from thedriver IC 40 to the selector 30 may be ⅓ of the number of the drainlines, for example. The relationship between the number of the drainlines Nd and the number of the video signal lead-out lines Nv isexpressed as Nd/Nv=n, where n denotes an integer equal to or larger than2.

Scanning circuits 11 for supplying scanning signals to the scanninglines 10 are disposed at both sides of the display region 1000. As FIG.2 shows, the selector 30 is disposed adjacent to the display region1000. As the display region 1000 has the racetrack shape, the selector30 partially exists between the scanning circuit 11 and the displayregion 1000 in a region A outside the curved side of the display region1000. In this case, wiring interference occurs between the scanning line10 and the selector 30.

FIG. 9 is a plan view of the display device having the rectangulardisplay region 1000. Referring to FIG. 9, the selector 30, the driver IC40, and the terminal part 150 are sequentially arranged below thedisplay region 1000. The scan circuits 11 are disposed at both sides ofthe display region 1000. In this case, there is no interference betweenthe scanning lines 10 extending from the scanning circuit 11, and theselector 30.

The variant-shape display panel according to the present invention isconfigured to prevent interference between the scanning line 10 and theselector 30, and reduce the frame region. FIG. 3 is a view of theequivalent circuit indicating the structure of the selector 30, theupper side of which corresponds to the display region, and the lowerside of which corresponds to the driver IC. Referring to FIG. 3, pixels50 each having the TFT 51 and the pixel capacitor 52 are laterallyarranged. The video signals are supplied to the respective pixels 50 viathe drain lines 20. The TFTs 51 of the respective pixels 50 arecontrolled by the scanning lines 10.

The selector 30 is disposed adjacent to the outermost part of thedisplay region to reduce the number of the drain lead-out lines (videosignal lead-out lines) 21 outside the display region. The selector asshown in FIG. 3 reduces the number of the video signal lead-out lines 21output from the driver IC to ⅓ of the number of the drain lines 20. Itis therefore possible to save the area for routing wiring of the videosignal lead-out lines 21.

Meanwhile, selector control lines 31 are necessary for controlling theselector 30. FIG. 4 is a plan view representing arrangement of theselectors 30 and the pixels 50 in a region A as shown in FIG. 2.Referring to FIG. 4, sets of three pixels 50 including a red pixel R, agreen pixel G, and a blue pixel B are arranged into a step-likeformation so that the outer end of the display region 1000 isapproximated to the curve. The selectors corresponding to the respectivepixel sets are disposed adjacent thereto. Unlike the general case havingthe common bus wiring formed adjacent to the outer end of the displayregion 1000 for applying the common voltage to the common electrode onthe display region, the present invention is configured to dispose theselectors 30.

Each pixel is connected to the scanning line from the scanning circuitdisposed outside in the lateral direction as shown in FIG. 4. In otherwords, the selector 30 includes the selector TFT, and accordingly, it isnecessary to prevent interference between the scanning line and the gateelectrode of the selector TFT, that is, the selector control line.

FIG. 5 is a plan view representing the wiring layout around the end partof the display region in the state where the drain lines 20 have beenformed. In the display region as shown in FIG. 5, the longitudinallyextending drain lines 20 each of which is bent into the V-like shape arearranged in the lateral direction. The laterally extending scanninglines 10 are arranged in the longitudinal direction. The respectivepixels are formed in the regions defined by the drain lines 20 and thescanning lines 10, on which the pixel electrodes are formed. As FIG. 5shows, the pixel electrode has not been formed yet, and the part atwhich the drain lines 20 are formed becomes the display region as dottedline indicates.

The selector TFTs 32 are disposed adjacent to the pixel at the outermostperiphery for the respective drain lines 20. Three selector controllines 31 extend outside the selector TFTs 32 for sending the gate signalto the respective selector TFTs 32. In order to prevent interferencebetween the scanning line 10 and the selector control line 31, theselector control lines 31 are wired on the same layer on which the drainlines 20 are formed so as to be applied onto the same layer on which thescanning lines 10 are formed via the through hole just before connectionwith the selector TFTs 32. This makes it possible to dispose theselectors 30 adjacent to the display region in spite of thevariant-shape display region.

The video signal is sent to the set of three selector TFTs 32 via thecommon video signal lead-out line 21. The video signal is divided andallocated to the drain lines 20 by the signal via the selector controlline 31. As a result, the number of the video signal lead-out lines 21is ⅓ of the number of the drain lines 20 as FIG. 5 shows. The presentinvention is configured to dispose the selector adjacent to the displayregion so that the video signal lead-out line 21 intersects the scanningline. In the case where the selector is disposed apart from the displayregion, the number of the crossing points between the video signallead-out lines and the scanning lines is reduced, which may increase thenumber of crossing points with the drain lines. The structure accordingto the present invention ensures reduction in the number of the crossingpoints between the scanning lines and the drain lines. Furthermore, theselector control line 31 interposed between the video signal lead-outline and the selector allows reduction in the crossing points betweenthe selector control lines and the video signal lead-out lines, whilereducing the length of the selector control line. Referring to FIG. 5,the selector control line is disposed along the selector. It is alsopossible to dispose the selector control line parallel to the videosignal lead-out lines. This makes it possible to further reduce thelength of the selector control line.

As FIG. 4 shows, the number of pixels in Y-direction corresponding toeach selector varies in accordance with the X-direction. For example, inthe linear outer shape part of the display region 1000, 320 pixels arecovered by the selector 30. In the curved outer shape part of thedisplay region, the minimum of 6 pixels are covered by the selector 30.

In the aforementioned state, each resistance or capacity of the wiringcovered by the respective selectors 30 varies, and accordingly, themagnitude or delay of the signal may vary depending on the location. Thepresent invention is configured to change the channel width of theselector TFT 32 in accordance with the location for the purpose ofpreventing the variance. For example, the channel width of the selectorTFT 32 to be disposed on the linear part is made larger than the channelwidth of the selector TFT 32 to be disposed on the curved part. Thechannel width of the selector TFT 32 to be disposed on the curved partis also changed in accordance with the location. This makes it possibleto generate uniform image in spite of the variant-shape display panel.

FIG. 6 is a plan view showing a state where the pixel electrodes 112have been formed on the same region as shown in FIG. 5. In other words,FIG. 6 represents that the inorganic passivation film, the organicpassivation film, the common electrode, the capacitive insulation film,and the pixel electrode have been laminated to form the layout on theregion as shown in FIG. 5. As FIG. 6 shows, the part at which the drainlines 20 are formed becomes the display region as dotted line indicates.

FIG. 6 shows that the common electrode 110 as the transparent electrodeis formed over the entire surface except the through hole 130. On thedisplay region, the pixel electrode 112 is formed through the ITOprocess in the region defined by the drain line 20 and the scanning line10. A dummy pixel electrode 1121 having the same shape as that of thepixel electrode 112 is formed outside the display region at the samepitch as the pixel electrode 112. This makes it possible to form thepixel electrode 112 at the outermost part of the display region underthe same process conditions as those for forming the pixel electrodes112 in the display region. It is possible to apply the common voltage tothe dummy pixel electrode 1121, which will be described later.

FIG. 7 is a sectional view taken along line A-A of FIG. 5, illustratinga cross section of the area around the selector TFT 32. The layerstructure is the same as the cross section structure of the displayregion as described referring to FIG. 1. In other words, the gateinsulation film 104 is formed on the semiconductor layer 103, on whichthe gate electrode 105 is formed. The interlayer insulation film 106 isformed to cover the resultant layer.

The gate electrode 105 is connected to the selector control line 31, andthe source electrode corresponds to the video signal line 21. The drainelectrode corresponds to the drain line 20. In other words, two sourceelectrodes are formed in parallel with each other to constitute theselector TFT 32. The inorganic passivation film 108 is formed whilecovering the drain electrode and the source electrode, on which theorganic passivation film 109 is formed. The common electrode 110planarized by the ITO process is formed on the organic passivation film109.

The capacitive insulation film 111 is formed to cover the commonelectrode 110, on which the dummy pixel electrodes 1121 are formed. Thepresent invention is configured to allow the common electrode 110 tocover the upper part of the selector TFT 32. The common electrode 110 isformed successively with the common electrode 110 on the display region.The aforementioned structure allows the common electrode 110 to shieldthe selector 30. The common voltage is applied to the common electrode110 from the common wiring (common bus wiring) disposed outer than theselector 30.

Generally, the common bus wiring is formed adjacent to the displayregion. The present invention is configured to form the common buswiring at the position outer than the selector 30. The structure allowsthe selector control line 31 to be formed on the same layer on which thedrain line 20 or the common bus wiring is formed.

If the dummy pixel electrode 1121 as shown in FIG. 6 is not required tobe brought into the floating state, a through hole 140 is formed in thecapacitive insulation film 111 as indicated by the right side of FIG. 7so that the common voltage is applied to the dummy pixel electrode 1121.The through hole 140 may be formed in the capacitive insulation film 111simultaneously with formation of the through hole 130 in the displayregion.

As described above, the present invention allows the variant-shapedisplay panel to form the selector adjacent to the display region, whichensures to prevent increase in the area of the frame region of thevariant-shape display panel. The selector may be shielded by the commonelectrode, and the channel width of the selector TFT is varied inaccordance with the location, resulting in uniform display screen on thevariant-shape display panel.

The variant-shape display panel with racetrack shape as shown in FIG. 2has been described. The present invention, however, is applicable to theheart-like variant-shape display panel as shown in FIG. 8. Thesubstantially the same structure as the one described referring to FIG.2 may be applied to the shape as shown in FIG. 8. That is, the structurewhich is substantially the same as the region A shown in FIG. 2 may beapplied to the region A as shown in FIG. 8. Referring to FIG. 8,however, as the upper part of the display region is not linearly shaped,the capacity of the selector TFT to be disposed below the displayregion, that is, the channel width has to be changed even at the linearpart.

Each of the variant-shape display regions as shown in FIGS. 2 and 8 isformed by combining the linear part and the curved part. However, thepresent invention is applicable to the display device with the displayregion formed by combining linear sides into such shape as triangle,pentagon, and hexagon. Referring to FIGS. 2 and 8, the scanning circuitsare disposed at both sides of the display screen. However, the presentinvention is applicable to the structure having the scanning circuitsdisposed at one side of the display screen. Application of the presentinvention is not limited to the liquid crystal display device, but tothe display device of arbitrary type, such as the organic EL displaydevice, which includes the display region shaped other than a rectangle,and the selector (switching circuit) for time division supplying thevideo signal to the drain lines (video signal lines) on the displayregion.

What is claimed is:
 1. A display device comprising a display region having a shape other than a rectangle and including a TFT substrate on which a scanning line, drain lines and video signal lead-out lines are formed, wherein: a selector is disposed between the drain lines and the video signal lead-out lines; the scanning line is connected to a scanning circuit for supplying a scanning signal; the scanning line and the video signal lead-out lines cross with each other; the number of pixels in an extending direction of the scanning line in the display region is different from the number of pixels in an extending direction of the drain lines; and the selector has selector TFTs, and a channel width of one of the selector TFTs corresponding to a row having a larger number of the pixels in the extending direction of the drain lines is larger than a channel width of another of the selector TFTs corresponding to a row having a smaller number of the pixels in the extending direction of the drain lines.
 2. The display device according to claim 1, wherein a common wiring is disposed between the selector and the scanning circuit.
 3. The display device according to claim 1, wherein a selector control line connected to gates of the selector TFTs comprises the same layer as the drain lines.
 4. The display device according to claim 1, wherein a selector control line connected to gates of the selector TFTs is disposed between the video signal lead-out lines and the selector.
 5. The display device according to claim 2, wherein a selector control line connected to gates of the selector TFTs is disposed between the video signal lead-out lines and the selector.
 6. The display device according to claim 4, wherein the selector control line comprises the same layer as the drain line.
 7. The display device according to claim 2, wherein the scanning circuit is disposed between the common wiring and an end of the TFT substrate.
 8. The display device according to claim 3, wherein: the selector control line and the scanning line cross with each other via an insulation film; and the selector control line and the video signal lead-out lines cross with each other via the insulation film.
 9. The display device according to claim 1, wherein: the video signal lead-out lines are connected to a driver IC; the driver IC is formed along a first side of the display region; and the scanning circuit is formed in a scanning circuit region that is along a second side adjacent to the first side of the display region and a third side opposite the second side.
 10. The display device according to claim 9, wherein: an outer shape of the display region is formed by combining a linear part and a curved part; and the driver IC is disposed corresponding to the linear part.
 11. The display device according to claim 9, wherein: an outer shape of the display region is formed by combining a linear part and a curved part; the driver IC is disposed corresponding to the linear part; and a channel width of the selector TFT corresponding to the linear part is larger than the channel width of the selector TFT corresponding to the curved part.
 12. A display device comprising a display region having a shape other than a rectangle and including a TFT substrate on which a scanning line, drain lines and video signal lead-out lines are formed, wherein: a selector is disposed between the drain lines and the video signal lead-out lines, and connected to the drain lines and the video signal lead-out lines; the scanning line is connected to a scanning circuit for supplying a scanning signal; the scanning line and the video signal lead-out lines cross with each other; an outer shape of the display region is formed by combining a linear part and a curved part; the video signal lead-out line is connected to a driver IC, and the driver IC is disposed along a first side of the display region corresponding to the linear part; the scanning circuit is formed in a scanning circuit region which is along a second side corresponding to the curved part adjacent to the first side of the display region and a third side opposite the second side; and the selector has selector TFTs, a channel width of one of the selector TFTs corresponding to the linear part is larger than a channel width of another of the selector TFTs corresponding to the curved part.
 13. The display device according to claim 12, wherein a common wiring is disposed between the selector and the scanning circuit.
 14. The display device according to claim 12, wherein a selector control line connected to gates of the selector TFTs comprises the same layer as the drain lines.
 15. The display device according to claim 12, wherein a selector control line connected to gates of the selector TFTs is disposed between the video signal lead-out line and the selector.
 16. The display device according to claim 13, wherein a selector control line connected to gates of the selector TFTs is disposed between the video signal lead-out line and the selector.
 17. The display device according to claim 16, wherein the selector control line comprises the same layer as the drain line.
 18. The display device according to claim 13, wherein the scanning circuit is disposed between the common wiring and an end of the TFT substrate.
 19. The display device according to claim 14, wherein: the selector control line and the scanning line cross with each other via an insulation film; and the selector control line and the video signal lead-out line cross with each other via the insulation film. 